X-ray Reflectivity Evaluation for the Density of

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X-ray Reflectivity Evaluation for the Density of Au Thin Film Deposited on SiliconZHANG Yan-ping[1] CHANG Hong-wei[1] DU Shu-bin[1] Kenji Sakurai[2][1]不详 [2]National Institute for Materials Science, Tsukuba, Ibaraki 305-0044, Japan摘　要:
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( H+ e  g: v, D8 e) f关键词:极低密度 Au薄膜 X射线 评价 反射 沉积 硅 金薄膜

分类号:　O434.1 TQ325.12[机标]
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4 @5 K* z; z, M6 K) m; ~X-ray Reflectivity Evaluation for the Density of Au Thin Film Deposited on SiliconAbstract:In present work, we will reports puttered gold thin film that sometimes has extremely low density （6.1 g/cm^3, 32% to the bulk value 19.3 g/cm^3 found in the literature） based on XRR studies, low-density sample is thick and the thickness is about 3.29 times to that of high-density sample, XRR measurements see Fig. 1.[第一段]

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