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1315 nm高反射率硅镜的膜系分析‘ ) ^, g& q2 C& g# U& C- u! I
彭玉峰程祖海张耀宁周次明杨春华
0 f+ i$ [0 w" P7 v" p" h/ D(华中科技大学激光技术国家重点实验室,武汉430074) 2 k) `0 \) ~) }- |) }
提要利用TFCALC薄膜设计软件包对TiQ/SiO-TaiOsISO,和S/Sio,膜系中心波长为1315- 的硅镜反射特 % x" Z- q: a8 Z A
性进行了仿真模拟。给出了正人射与45'斜入射情况下三种膜系硅镜的反射特性,并进行了分析与讨论。
; ?" e; f* y! Z7 ^) U* {关健词化学氧碘激光器,硅镜,高反射率,薄膜 4 S0 Z7 [3 X7 ?+ @& {- {0 m
中圈分类号0484.5 文献标识码A
: j4 R! |4 F2 J" ?Analyses of Si-mirror Film Systems with High Reflectance at 1315 nm
% t+ R' L. T; [/ ?+ E* ?8 a. LPENGY u-feng CHENG Zu-hai ZHANGY a-oning ZHOU Ci-ming YANG Chun-hua
+ x( b% }; |9 r/ a6 E r?Yational Key Laboratory for Laser Technology,H-zhong Unirrrsity of Science and Tech-log ,Wthan 430074
c3 q' Q0 l# y$ ^Abshxt Reflectancep ropertieso fsi limrtm irrorsw ithT iO,/SO,.,T ar05/&O,,andS ifSiO,fi lm systemsa t1 315n m
, T* D; @1 }- R8 w$ xare manericaly analyzed, and disrvssed under conditions of normal and 45' tilt angle incidence, respectively. The results
0 W0 A% ]* @2 m: W# b1 Y( a& Vshowt hatre flectancep ropertiesof T iO,/SOran dT a,q渴qaresi milar;th eoreticalre flectivityis le ssth an9 9.9596fo r . q* @5 u0 J4 e
1315 nm laser wavelength. Theoretical reflectivity of Si(c)/SiQ stack can be more than 99.9996 / l1 [: F% X3 i+ v; |, r0 A" Q
Keyw ards CO IL,s itiornm irorrs,fi lm,h ighr eflectivity |
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