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1315 nm高反射率硅镜的膜系分析‘ , U9 L# q' m i% k
彭玉峰程祖海张耀宁周次明杨春华
; G% E! F2 q. F8 ]5 H(华中科技大学激光技术国家重点实验室,武汉430074)
" M8 i7 l7 ~9 R5 L0 O. i3 }# K提要利用TFCALC薄膜设计软件包对TiQ/SiO-TaiOsISO,和S/Sio,膜系中心波长为1315- 的硅镜反射特
+ z7 Y" L# v9 z/ ?9 Z9 z性进行了仿真模拟。给出了正人射与45'斜入射情况下三种膜系硅镜的反射特性,并进行了分析与讨论。
$ h& m" X) w6 Q o% K关健词化学氧碘激光器,硅镜,高反射率,薄膜
j ]* J$ S. q% I* N! ?; S中圈分类号0484.5 文献标识码A
- ~9 V+ C! K8 l# x: j( xAnalyses of Si-mirror Film Systems with High Reflectance at 1315 nm . F3 L- v' A+ `* ]& n& P$ d/ R
PENGY u-feng CHENG Zu-hai ZHANGY a-oning ZHOU Ci-ming YANG Chun-hua
- B5 _. k% z6 ~& @/ _0 w8 C+ Q?Yational Key Laboratory for Laser Technology,H-zhong Unirrrsity of Science and Tech-log ,Wthan 430074
5 G/ p- v! b3 t+ d1 {Abshxt Reflectancep ropertieso fsi limrtm irrorsw ithT iO,/SO,.,T ar05/&O,,andS ifSiO,fi lm systemsa t1 315n m
" B, M4 t7 U# I4 care manericaly analyzed, and disrvssed under conditions of normal and 45' tilt angle incidence, respectively. The results 9 L5 l* J, Z4 n6 w' o0 f
showt hatre flectancep ropertiesof T iO,/SOran dT a,q渴qaresi milar;th eoreticalre flectivityis le ssth an9 9.9596fo r / k( N. T4 d9 w: U; Y+ R% B) t/ v
1315 nm laser wavelength. Theoretical reflectivity of Si(c)/SiQ stack can be more than 99.9996 2 H4 E/ C; g$ s/ Z8 o9 U1 C
Keyw ards CO IL,s itiornm irorrs,fi lm,h ighr eflectivity |
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