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1315 nm高反射率硅镜的膜系分析‘ # n9 k; a: l _: y5 Y* u
彭玉峰程祖海张耀宁周次明杨春华 8 e4 |2 L8 n; t, G
(华中科技大学激光技术国家重点实验室,武汉430074) 8 ^ V5 N' _( x/ d& E
提要利用TFCALC薄膜设计软件包对TiQ/SiO-TaiOsISO,和S/Sio,膜系中心波长为1315- 的硅镜反射特 ( Y8 {$ \0 a) X1 i! G' r
性进行了仿真模拟。给出了正人射与45'斜入射情况下三种膜系硅镜的反射特性,并进行了分析与讨论。 , L" w: T$ c* Q3 H: W- u: N
关健词化学氧碘激光器,硅镜,高反射率,薄膜 ) Y" m8 M$ e: h
中圈分类号0484.5 文献标识码A
$ R& P6 x% ?( N0 B4 [Analyses of Si-mirror Film Systems with High Reflectance at 1315 nm
* I2 s) }. B" v! e' @2 I: a" b6 mPENGY u-feng CHENG Zu-hai ZHANGY a-oning ZHOU Ci-ming YANG Chun-hua - Z- ?( P, k5 G, A: L
?Yational Key Laboratory for Laser Technology,H-zhong Unirrrsity of Science and Tech-log ,Wthan 430074
! L% P2 N& F2 l/ {" JAbshxt Reflectancep ropertieso fsi limrtm irrorsw ithT iO,/SO,.,T ar05/&O,,andS ifSiO,fi lm systemsa t1 315n m . U) E0 s8 @/ j) V0 D
are manericaly analyzed, and disrvssed under conditions of normal and 45' tilt angle incidence, respectively. The results E/ _& E# [% L- d9 P! x& P* p9 z
showt hatre flectancep ropertiesof T iO,/SOran dT a,q渴qaresi milar;th eoreticalre flectivityis le ssth an9 9.9596fo r
8 W0 p: N+ B K) Y3 Y, [, T. E4 P1315 nm laser wavelength. Theoretical reflectivity of Si(c)/SiQ stack can be more than 99.9996 % M; [* J3 | q2 v
Keyw ards CO IL,s itiornm irorrs,fi lm,h ighr eflectivity |
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