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真空镀膜技术基础(英文)介绍目录

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发表于 2006-3-18 18:26:48 | 显示全部楼层 |阅读模式
NOYES PUBLICATIONS
2 P# B+ a9 ~' Z" m6 UWILLIAM ANDREW PUBLISHING* Y, @4 i( p4 l0 T+ O9 y' l
Norwich, New York, U.S.A.; l) L( E8 C7 `
Copyright © 2003, Noyes Publications / William Andrew Publishing. All rights reserved.
3 H* i2 m8 A4 H" g& [; S+ X# O6 FNo part of this book may be reproduced or utilized in any form or by any means, electronic or mechanical,
# S+ ?1 N( e, Mincluding photocopying, recording, or by any information storage and retrieval system, without permission, U( i. a  k9 c
in writing from the Publisher.
2 ~9 p7 O# w) g- i& q" {9 u) Y% ZCover Art © 2003 by Brent Beckley / William Andrew Publishing( O& D( [) v, s/ x
Library of Congress Catalog Card Number: 2003004260
3 m: H/ X5 ~& H6 |" KISBN: 0-8155-1495-60 T4 `; ^1 @4 W+ K8 e; V- o
Published in the United States of America by
$ n) u2 G3 @. \Noyes / William Andrew Publishing
( y# R# h9 o4 [3 N13 Eaton Avenue3 t' Y6 j6 ^( K
Norwich, NY 13815
; N7 m0 c2 k! g/ Q0 S1-800-932-7045, G/ _3 q" h7 Y
www.williamandrew.com. d( H& D$ K0 `9 W
www.knovel.com
" ^0 c. ^/ N, W5 D- U6 N% x10 9 8 7 6 5 4 3 2 1; P9 G; T& f7 ~: S0 t
This book may be purchased in quantity at discounts for education, business, or sales promotional use by
3 I4 X- y8 {  E' x4 M. \9 M% R, vcontacting the Publisher.
' q2 j! L7 c( h& Z7 W3 b. @) fWilliam Andrew Publishing, 13 Eaton Avenue, Norwich, NY 13815 Tel: 607/337/5000 Fax: 607/337/5090
/ ~8 \# P/ l, u2 l! ?Library of Congress Cataloging-in-Publication Data8 {$ u* a/ a$ W8 C) @: N
Mattox, D. M.# {/ n' V  Z3 T* Q6 r0 A9 ]' @8 u
The foundations of vacuum coating technology / Donald M. Mattox.
! I- e1 c- q0 j! Tp. cm.
9 v" s1 O( J8 e* ~  tISBN 0-8155-1495-6 (alk. paper)( k. y- ?6 C9 e& p, m& v; e- v3 d$ T
1. Vacuum metallurgy--Congresses. 2. Metal coating--Congresses. I. Title.0 B8 z4 {9 M1 y6 |2 x: S4 g
TN686.5.V3M38 2003
( I6 A! K6 r( r, {7 q8 Y669'.028'4--dc21
" M7 L, i5 l/ @% g! E5 i2003004260
1 Q" Y, V, }6 tNotice: To the best of our knowledge the information in this publication is accurate; however the Publisher: a; [- H3 d# Z
does not assume any responsibility or liability for the accuracy or completeness of, or consequences arising5 t3 ~: o! i' f
from, such information. This book is intended for informational purposes only. Mention of trade names or- E4 q* `6 g$ y0 U0 V! E
commercial products does not constitute endorsement or recommendation for use by the Publisher. Final
) X! \4 ^* \$ {5 Idetermination of the suitability of any information or product for any use, and the manner of that use, is the
6 b6 M' P+ f! y7 V) b* m& N5 E  e) Jsole responsibility of the user. Anyone intending to rely upon any recommendation of materials or procedures+ T) l+ i# H" i2 D" o) s
mentioned in this publication should be independently satisfied as to such suitability, and must meet all applicable
/ W6 Q' W. a, }2 ?2 O+ m- ~safety and health standards.7 L; g  n0 c7 T* E
Manufactured in the United States of America.1 ]& @5 G+ O+ w, X2 E
   
/ C2 P, F, n; [2 z- ZThe author would like to dedicate this book to his wife, Vivienne,
# w% p. V0 c. ?3 uwithout whose support and encouragement this book would not have been written.- x3 D8 h! y' X# }. W& ~
He would also like to dedicate the book to his granddaughter, Lindsey,, @- l! z. u2 t- ?& i  y
with the hope that when she grows up she will study the history
1 @! W4 t( D  ^+ ^9 s2 b5 e" O/ E+ U7 qof those subjects that are of interest to her.
. U' p) B) M8 n3 }8 O: @
+ x& ?- N8 ?7 b% p1 H      * L4 o( E# p3 B$ D$ t4 D2 L, I
    
) A% T$ L, r/ e2 o$ \% p  \& U" e. GThe author assumes responsibility for all errors of commission and omission and would like to encourage
- Z# \) K; x# q3 i2 }comments, corrections, and additions to be sent to donmattox@mpinm.com. The author would like to acknowledge
5 W# Z1 c% Y+ d& b. ICollin Alexander for providing material from the “proceedings” of the 1943 U.S. Army-sponsored conference
% Y7 y5 A: A1 D3 k! von “Application of Metallic Fluoride Reflection Reducing Films to Optical Elements”—the text of which
) V. X" U7 c( umay be found on the SVC Web Site at www.svc.org; Ric Shimshock for the reference to the early work on
2 f# }4 |5 L5 @magnetron sputtering on webs; Bob Cormia for his comments on the early development of planar magnetrons; and
( \+ Q* k1 o; b. \- T+ ]Angus Macleod for input on the early work in optical coatings. Russ Hill made some important contributions, as" ^% Z+ b4 Q+ O2 o. q7 L& N
did Bob Waits, who called my attention to Fred Wehner’s discussion on the etymology of the term “sputtering.”
$ g" \( n2 b, `; T* TThe author would like to express thanks to Phil Baumeister for calling attention to the very important RLG patent  l1 \+ n- w- m
and thus to some interesting patent litigation.
) `1 H0 x  d; K, L2 @7 _: FThe author would particularly like to thank Julie Filatoff for her expert editing and formatting of this book,0 E/ h0 U& L0 O/ [1 }; a7 S
Linnea Dueker for her excellent job of scanning the illustrations, and Julie Romig for her critical reading of the
8 g9 _( U% g% a7 e" Imanuscript. The SVC Oral History Project, located on the SVC Web Site at www.svc.org/H/H_OralInterviews.html,3 R% A7 D8 l& N# `' a6 [$ g
has also contributed some interesting details. Don Mattox would like to encourage anyone with historical papers,
# z: F4 c$ [" j$ I6 M# Lpatents, pictures, or other materials related to the history of vacuum coating to contact him at
# u; ]* E8 q( E& S- xdonmattox@mpinm.com.- @7 p/ |( K1 L2 I. z
2 o1 d  S: h1 Y
Vacuum coating processes consist of a source of vapor (atomic or molecular) of the material to be deposited,
  [: s/ I& v" s2 A7 C% Ztransport of the vapor to the surface to be coated, and condensation on the surface to form a thin film or coating* Z& C* }4 h) `5 h* }
with the desired properties. In the case of reactive deposition, availability of the reactive gas at the surface of the+ d" L: E0 A% E4 |
growing film and “activation” of the reactive gas are important.5 U& R2 R2 z# y0 @, T
Generally all the necessary ingredients for different vacuum-coating processes were present long before the
$ r& N5 q: [% a1 ~; S; ]; f" mprocess was used in production. In some cases, such as Edison’s “Gold Moulded” cylinder phonograph record
- e" |! b+ h! h/ qproduction (1902–1912), a vacuum coating process (“electrical evaporation,” “cathodic disintegration” or, as it
# M/ `3 u6 K: s/ K3 Z) ~was later called, “sputtering”) was the “enabling technology” that allowed mass production of the records. In% Z( I. ?1 m7 p: K: f
other cases the use of vacuum coating processes has supplanted the use of other coating processes, such as, o& Y: `' J9 r
electroplating, with a more environmentally friendly process. In still other cases the existence of vacuum coating$ u7 F& ?% \* Z3 p9 e$ X
processes allowed new applications and markets to be developed. An example is the deposition of “decorativefunctional”
6 E. a3 g( l. a8 rcoatings that have both a pleasing appearance (gold, brass, or gray-black for example) and wear
5 k; Y: \; u2 \" _# l7 Q! mresistance.0 Q  _8 ?0 [% y1 l4 S! ~. T; D8 U' U
As with many ideas, inventions, and inventors, it is often difficult to establish the originator of any particular2 ^" W% A$ I+ I; p  P  X2 p, L3 r
idea or invention. The search is complicated by the information being in both the patent literature and the scientific/
0 g& I3 K9 z5 `: l) etechnical literature. Patents seldom cite relevant technical papers and technical papers seldom cite relevant  J7 i% J, S- c) Y; r  K; T
patent literature., I) j5 ?7 g" l6 L+ @& H# |
The field of vacuum coating is continually evolving and new processes, materials, and applications provide a
+ ^6 w! Z6 H' t8 Bfertile field for the historian.! [3 q$ h0 @' t& i% T
“Those that do not know the history of their field are doomed to repeat
7 X0 ~& B, H4 j1 T6 {4 ^its mistakes or end up in patent litigation.” (G. Santayana, paraphrased)/ u1 M, n( F' ]# n

$ W2 u+ `# m; W& h% y1 E: A5 C        % t3 E; ?' j3 n) o# \" @
Preface ................................................................................................................................................................. vii
' p( j0 t0 ?6 O% M; }Introduction ........................................................................................................................................................... 1
; D6 j$ O7 I/ n4 b/ GEarly Vacuum Science and Technology ................................................................................................................. 2
7 L5 A) q* a5 v' n+ S1 }$ A% LEarly Electricity and Magnetism ............................................................................................................................ 5) e8 ]9 h7 K4 |9 h% a) E" b% a; ]
Early Plasma Physics and Chemistry ..................................................................................................................... 7
& Z5 R: c! ?0 b. j1 |3 TSome Scientific and Engineering Societies and Publications ................................................................................ 9
) |5 D* l7 M; U1 P  m1 OPatents and the U.S. Patent Office ....................................................................................................................... 109 E- D5 _% Y3 F3 f; i# R8 x9 E7 P; _; A5 p
Deposition Processes ........................................................................................................................................... 11( n* A2 D3 R# T) u! D9 V& C
Sputter Deposition ........................................................................................................................................ 111 H" Q0 W/ m, b
Thermal Evaporation .................................................................................................................................... 19  @2 Z1 u8 \" B6 A# G# b9 N0 ^: w
Arc Vapor Deposition ................................................................................................................................... 24
# _/ [6 q1 Y7 }+ P- |! S8 f% r, AChemical Vapor Deposition ........................................................................................................................... 27  O& Z4 M. m0 k9 E2 u: B0 R
Ion Plating ..................................................................................................................................................... 305 }& V4 O/ Y/ F* p  [$ a
Surface Preparation ............................................................................................................................................. 34
) y( G# X5 N; q% zSummary ............................................................................................................................................................. 37% ^: q$ N# o8 G1 [# G2 J2 Y
Endnotes .............................................................................................................................................................. 39
) ?6 k) u  {% s3 U" H# xReferences............................................................................................................................................................ 43
5 ]6 x+ n/ G1 @. cAcronyms Used in Vacuum Coating .................................................................................................................... 615 n, b& C- S( v( A* u
Glossary of Terms for Vacuum Coating .............................................................................................................. 69

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发表于 2006-4-11 20:23:41 | 显示全部楼层
楼主,我看到你的很多帖都非常好,这个呢,不大好说
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发表于 2006-4-11 20:24:33 | 显示全部楼层
应该是粘贴的时候出点问题
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发表于 2006-4-11 20:25:12 | 显示全部楼层
我相信楼主,支持之
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