650nm反射10.6μm透射的薄膜干涉滤光片

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650nm反射10.6μm透射的薄膜干涉滤光片邢政 付秀华 傅晶晶 庞薇长春理工大学,吉林长春130022摘　要:针对波长为650nm和10.6μm的激光器,选用了ZnS和YbF3作为膜料,采用离子辅助沉积技术,在多光谱ZnS基底上制备了650nm反射10.6μm透射的薄膜干涉滤光片。通过对膜系设计和优化工艺参数的研究,解决了膜层牢固性,改善了薄膜的激光损伤阈值,并给出了综合测试结果和实测光谱曲线。[著者文摘]

关键词:光学薄膜 硫化锌 离子辅助 激光损伤阈值
+ e$ p. H2 T1 P) H. u' o分类号:　TN305.8[著者标引]文献标识码：A文章编号：1001-5078（2008）05-0482-03栏目信息：光学薄膜技术
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$ {. `; j+ I  o  B6 J# _% ~Interference Filter of Reflectance in 650nm and Transmittance in 10.6μmXING Zheng,FU Xiu-hua,FU Jing-jing,PANG WeiChangchun University of Science and Technology,Changchun 130022,ChinaAbstract:On the substrates of multi-spectrum zinc sulfide prepared the coatings of reflectance in 650nm and transmittance in 10.6μm.The coatings were designed and optimized to split the laser of the working wavelength at 650nm and 10.6μm.ZnS and YbF3 were used as the materials and produced by means of ion assisted deposition.The methods of improving the adhesion of layers and the laser-induced damage threshold were studied by a series of experiments.Finally we showed the measurement curves and test results.[著者文摘]
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Key wordsptical thin film;ZnS;ion assisted deposition;laser-induced damage threshold

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