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薄膜资料(Thin film Material)连续送第2部分!(前言)

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发表于 2006-3-11 00:16:31 | 显示全部楼层 |阅读模式
Preface
) Z/ Q, m1 O  p: dWithin a period of a few decades, the ¯eld of materials science and engineering* b) B) m: f: i
has emerged as a focal point for developments in virtually all areas" K& S6 _; j& o6 Q# U5 E1 b
of engineering and applied science. The study of thin film materials has9 R+ N6 A* f, o! T0 Q& U, A, x; s
been one of the unifying themes in the development of the ¯eld during this9 S+ p: z8 a5 u+ r% I
period. As understood here, the area encompasses ¯lms bonded to relatively
( y4 o0 ~4 y( N! [3 M; h5 e2 Cthick substrates, multilayer materials, patterned ¯lms on substrates8 V# g4 K- J0 O$ q7 @
and free-standing ¯lms. Signi¯cant advances in methods for synthesizing
' k5 }* u! U) ]0 }# K, band processing these materials for ever more speci¯c purposes, as well as in
2 I1 F  w8 a  B# e% tinstrumentation for characterizing materials at ever diminishing size scales," `  t; Y5 l' _2 i8 n# w
have been key to modern engineering progress.
' t1 L. Q: M( H, tAt the dawn of the 21st century, the United States National Academy
% z7 w! d* j' iof Engineering reported the outcome of a project intended to identify the
/ w  U' W/ n, `twenty most signi¯cant engineering achievements of the preceding century., ?5 {: K4 a! l9 A& `
It is evident from the list compiled that achievements of the second half
1 R0 Y2 k5 X2 \( r5 ^; x( c; Lof the twentieth century { electronics, computers, health technologies, laser
" W7 G! I& w5 h$ @and ¯ber optics, for example { were all based on the creative and e±cient, z* d" n2 O5 t0 T* t, J; {
exploitation of materials; thin ¯lm materials represent a major component1 }# A9 G/ `1 v! w$ M: ]- U
of this advance in materials technology. In fact, the impact of advances
. i/ h- }; S5 b3 b" U; Pin the specialized uses of materials was so pervasive in the achievements
' X1 c. N5 X& }( Z9 Jbeing recognized by the Academy that the development of high-performance
) c; k+ y. i) I+ L5 qmaterials itself was included as one of the most signi¯cant achievements.
3 N. l' b2 n4 G+ K% c; \( T" t3 XThe goal of this book is to summarize developments in the area of thin
& T5 W1 O) `+ G5 e2 x  I0 U¯lm materials that have occurred over the past few decades, with emphasis
& {) I1 R7 u+ v9 L1 r1 P5 Q6 kon the generation of internal stress and its consequences. Internal stress can( `8 h7 X: V4 z: L( Q. w5 a) }* W
induce a variety of undesirable consequences including excessive deformation,. O, k' A9 |1 s  }( f, X6 Q' x# Q
fracture, delamination, permanent deformation and microstructural8 r& y1 X( i7 J3 {, |
alterations. In spite of these possibilities, thin ¯lms have been inserted
( W' m$ Q) N  y0 f$ t8 {1 ~9 Q: Cinto engineering systems in order to accomplish a wide range of practical: @& ~! F2 k* Z- `) N
xv
1 D6 w* G" Y& u# E0 rxvi Preface
7 K- |' Q3 r8 l" w3 |0 C* x# fservice functions. Among these are microelectronic devices and packages;
) Z3 h4 n. [$ m+ f; n- Bmicro-electro-mechanical systems or MEMS; and surface coatings intended6 Y% q+ ^8 X& F- S$ ^( P
to impart a thermal, mechanical, tribological, environmental, optical, electrical,
* c2 @0 g& s( h# u2 N0 @7 ]# C. gmagnetic or biological function. To a large extent, the success of this+ u0 w' ]  Y) e! W! B0 d
endeavor has been enabled by research leading to reliable means for estimating8 l- U4 m; Q0 u; h
stress in small material systems and by establishing frameworks in& C( O; v  }) l5 L/ p, U9 Z; y
which to assess the integrity or functionality of the systems. The prospect- S: a' W, d, A' }7 e3 ~
for material failure due to stress continues to be a technology-limiting barrier,
# q) J! q6 Q; ]& ~even in situations in which load-carrying capacity of the material is not
) ?; y% O6 S% B9 b  I( f) _- [among its primary functional characteristics. In some circumstances, stress7 ]/ I& a9 G6 I  K' B) R
has desirable consequences, as in bandgap engineering for electronic applications
1 s+ r: _5 `- t$ q4 ^8 o+ J6 k) Fand in the self-assembly of small structures driven by stored elastic
  E2 q8 z; K  e  U& q2 A; J. penergy. It is our hope that the information included in this book will be- {- |6 E( q+ H
useful as an indicator of achievements in the ¯eld and as a guide for further  |  j# {8 P& S% B' H+ b( n
advances in a number of new and emerging directions.6 R# ]! K9 K2 P% {; r) b7 Z
The ¯rst chapter is devoted largely to a discussion of the origins of
0 [# ~- R5 @, L6 X* aresidual stress in thin ¯lm materials and to identi¯cation of relationships
) U2 N$ c) I% v/ b1 _9 i" t" B# Wbetween processing methods and generation of stress. The consequences of% \4 j5 r! }( e6 Q
stress are discussed in subsequent chapters, with the presentation generally9 w) e7 P) G# i( L
organized according to the size scale of the dominant physical phenomena6 [* b  X6 k: `; Q9 o: [9 C
involved. Overall deformation of ¯lm-substrate systems or multilayer structures
0 O, x/ K2 Y( y# Kare considered in Chapters 2 and 3. This is followed by examination& u8 v% f) E1 a1 ^+ M
of the general failure modes of fracture, delamination and buckling of ¯lms
* n5 U9 W/ n1 [+ {in Chapters 4 and 5. The focus then shifts to a smaller scale to discuss
  k% o' {0 `7 ^conditions for dislocation formation in Chapter 6 and inelastic deformation
2 f: t- u( W( m5 K( pof ¯lms in Chapter 7. Finally, the issues of stability of material surfaces
  }8 v; a/ J0 V2 Y& s0 Qand evolution of surface morphology or alloy composition are considered in- u3 X+ s! c  }2 L; Y
Chapters 8 and 9. The consequences of stress in thin ¯lms is linked to the
/ o8 f) c9 _. P0 istructure of the ¯lm materials wherever possible.$ L8 C, H  j- ~) x
It is recognized that each of the principal topics covered in the book
6 G2 D+ N! e( s5 z, Y) Y2 t% r+ Gcould itself be developed into a substantial monograph, but the goal here- {. o- I! L) ?& H  J: j
is not the exhaustive treatment of a topic of limited scope. The area is6 W) Q! s# B" C! e
inherently interdisciplinary, and the intention is a provide a comprehensive+ K. s2 m+ g: _' V
coverage of issues relevant to stress and its consequences in thin ¯lm materials.
8 w* O- U" V. V: m& K; l, Y; }Adoption of this approach meant that many choices had to be made
8 k+ Q+ k: H0 r% N# kalong the way about depth of coverage of speci¯c topics and balance among. A! P. ]  a4 s% d6 C4 V
di®erent topics; we hope that the readers will judge the choices made to be
+ Z- a  U! c; A) r0 r8 C. }reasonable. The main purpose of the book is the coherent presentation of
, ^! K; i; b8 g) _) jthe sound scienti¯c basis for describing the origins of stress in ¯lms and for. ]6 h& J% O6 i7 M$ z5 g- I
anticipating the consequences of stress in defect formation, surface evolution
* d. ]% }, \8 C& PPreface xvii% a8 D3 z7 g1 E. S
and allied e®ects. Many references to original work are included as a guide
9 ^* a. Y: |' g1 \  t+ Eto the archival literature in the area. In addition, the fundamental concepts3 p1 R$ d& n0 C
developed are made more concrete through implementation in sample calculations
: F( A) b- C8 s! A8 Wand through discussion of case studies of practical signi¯cance. The) k& i6 P4 d' n" Z- k* p9 v
description of experimental methods, results and observations is included$ S9 u0 `8 w! i) p8 ^% s: R; c% _
as an integral part of developing the conceptual structure of the topics examined.
) d: c9 m, {+ L7 AEach chapter concludes with a set of exercises that further extend
6 N: ?1 d$ \0 f! O3 p- _* z+ h8 Dthe material discussed, and which can challenge newcomers to the area at7 V' ?, Z2 C% J$ X
applying concepts. It is our hope that, with this structure, the book will3 o4 a# O! N8 M! W
serve as a research reference for those pursuing the area at its frontiers, as a  d9 m% Q+ O3 B. R+ A8 U: g
useful compilation of readily applicable results for practicing engineers, and" {+ o) v3 g& ~# n% G# c
as a textbook for graduate students or advanced undergraduate students
( C0 ~8 }9 w$ Z, gwishing to develop background in this area.
6 P5 `5 v' ^$ a7 Q$ x0 xThe idea for the book grew out of a course on thin ¯lms that has* ]2 B, S1 F$ G+ i* C! V' g* W6 e
been o®ered for students in solid mechanics and materials science at Brown" V, i' `) S/ v7 x9 A5 n  C' }
University since 1992, as a natural outgrowth of emerging research activity1 ]& B" m8 m; @4 Z$ o* f
in the area. We are grateful to the many students, postdoctoral research7 ~1 S6 t* B% Q$ i* x
associates and colleagues who attended these lectures and whose enthusiasm
5 ]( o- ]- b9 |6 W3 N$ igave this project its initial impetus./ ^- h# _# F+ h: _" q8 l
We are also grateful to many colleagues who have contributed in various  [6 b; q6 u0 {/ a. E
ways to the preparation of this book. We particularly thank John
7 B+ |* a4 K# P8 t# l" c3 a3 H8 U. oHutchinson who used a draft of parts of the book for a course for graduate
& }7 o4 z7 V1 K0 Ostudents at Harvard and MIT, and who provided valuable feedback on this8 W0 O" v4 r' G- [1 `6 ?6 o
material. Both John Hutchinson and Bill Nix kindly shared with us their
) ?% O0 D; J4 g8 ]) ~2 iown course materials on thin ¯lms. Several colleagues read drafts of various1 o. Q4 N, z' T3 Y5 t
sections of the book and o®ered helpful recommendations; they include# ]7 ^# O9 W* R" G% a
Ilan Blech, Eric Chason, Ares Rosakis, Vivek Shenoy and Carl Thompson.
! A( N) N' X6 p: Y; R( L: ySeveral graduate students who took courses based in part on draft chapters,
: y& _3 A- o2 |+ I8 kparticularly Yoonjoon Choi and Nuwong Chollacoop, suggested a number of
  {( }$ K: J; T' W# Qclari¯cations and improvements in the presentation. Finally, we are grateful
+ U1 @1 V+ R! Xto the many colleagues who provided ¯gures and micrographs from their
0 c' U! P7 _( X! n& g+ ^own work; in these cases, acknowledgments are noted along with the included8 m2 F8 X' q, }* A, c( }2 y
material. Tim Fishlock at Cambridge University Press o®ered us
1 l- T0 F7 m6 l/ \0 O( Econsiderable °exibility in the formulation of the scope of this book and in
& s" E2 \: Y+ ?7 j& B4 X% |the preparation of the document.( `+ y0 \( a, Q7 Q5 |4 f
LBF is grateful to the Materials Research Science and Engineering
! ]3 L5 r5 c6 w. Z9 e, n0 UCenter, funded by the National Science Foundation at Brown University,5 O; D7 \# F9 }& \
for long-term support of research in the general area of thin ¯lms and for
# ^5 }; P1 s6 {1 r, E( rthe collaborations fostered through the Center. He is also thankful to the- y* G* E; r+ c- g" g
Division of Engineering and Applied Sciences at Caltech for hosting a sabxviii
9 h4 v. m4 _8 @" \- aPreface
$ L2 D. M3 Q1 P/ `8 ybatical leave; the kind hospitality and congenial environment a®orded an
+ n1 k. P5 Y! J( s* t7 Iopportunity for pursuing the book writing project at its early critical stage.4 B+ S" N5 [; x6 s
SS is grateful to the Defense University Research Initiative in NanoTechnology,, n8 {( \! _4 T& b% i
funded by the O±ce of Naval Research at MIT, and the Programme on( J% o3 x; B5 O" d: m
Advanced Materials for Micro and Nano Systems, funded by the Singapore-- ?# Z5 V9 n7 Q  ~( y
MIT Alliance, for their ¯nancial support for research in the areas covered
3 |5 B2 u4 t$ K% |. Nby the book.
, V. h6 m0 P- R* S8 d: k# F# FA project of this magnitude would not have been possible without
% C" {- G4 B: H) x/ r$ Z' S1 ethe support and encouragement of the members of our families. We are+ T! |' W- `5 o% s9 M( {- n
extremely grateful for their enduring patience and understanding during& D" ~7 G' c1 V- f/ M, \
our long hours of immersion in this project over the past several years.9 k, M/ ~' E( k% V
L. B. Freund and S. Suresh
  t  N' Y( x5 A: V# fJanuary 2003

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发表于 2006-4-11 14:27:45 | 显示全部楼层
顶啊
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发表于 2006-4-11 20:06:58 | 显示全部楼层
好象这里挺热闹的。
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发表于 2006-4-11 20:08:52 | 显示全部楼层
确实不错,支持
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发表于 2006-4-11 20:09:19 | 显示全部楼层
应该还有后文吧
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发表于 2006-4-11 20:09:51 | 显示全部楼层
期待楼主的新帖
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发表于 2006-4-13 15:41:59 | 显示全部楼层
我顶
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发表于 2006-4-15 02:43:33 | 显示全部楼层
谢谢楼主,收藏了
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发表于 2006-4-23 15:22:00 | 显示全部楼层
楼主何不做个好事,把书发出来,让我们来下载呀
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