关于提高附着力的办法（英文）

There are a number of ways to modify the nucleation density of
depositing atoms on substrate surfaces including:
* z8 e  N: t! t• Change the deposition temperature
increasing—increases reaction with the surface; increases surface mobility
5 X  q9 f& i6 h* v# d& Jdecreasing—decreases surface mobility
• Increase the deposition rate to increase collision probability of the adatoms
• Change the surface chemistry to make the surface more
reactive—e.g., cleaning,oxygen treatment of polymer
. K% A; `" x+ Ysurfaces
& p3 V4 g: s: p, R9 f0 [• Sensitizing the surface by the addition of “nucleating agents”
/ l( z( P  S& `9 Y% M• Generation of nucleation sites on the surface—e.g., lattice
" F1 O* M, T+ S. V3 Kdefects, charge sites on insulators by
, t) ?2 X5 u0 d2 V$ ?+ A0 c© energetic particle bombardment to produce lattice
$ E6 w1 ~+ L' ^* P6 A3 Zdefects
© incorporation of species into the surface by ion
implantation or chemical substitution
© electron bombardment —charge centers on
insulator surfaces
© photon bombardment ]—charge centers on insulator
Surfaces
$ [( d% u9 |+ {% h2 k% Y! w' t• Co-deposition or absorption of reactive species
& n) \6 F" ^; i, p9 R• Surface morphology—roughening or smoothing
4 o2 x9 v& |* ]) |4 s- V( {• Creation of a new surface—“basecoat” or “glue layer”

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