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线性渐变滤光片镀制挡板设计秦洁玉 罗崇泰 马勉军兰州物理研究所,表面工程技术国家级重点实验室,甘肃兰州730000摘 要:提出了一种膜厚修正挡板的设计方法,分析给出了使用挡板情况下基片膜厚和监控片膜厚的关系,对线性渐变滤光片镀制挡板进行了设计,给出了设计结果。用设计的挡板成功镀制了线性渐变滤光片,并给出了镀制结果。[著者文摘]2 J7 O% G$ e3 ?! {( r' [
5 W; r. Y- j/ x3 H3 R关键词:薄膜厚度 修正挡板 设计
4 S3 l& T- T! m/ A7 ~分类号: O484.221[著者标引]文献标识码:A文章编号:1006-7086(2007)01-0057-06栏目信息:知识与进展8 q# Q+ v. r2 V& S3 r) G+ R" i
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* }7 T( B' ]% LMASK DESIGN FOR LINEAR VARIABLE FILTERSQIN Jie-yu, LUO Chong-tai, MA Mian-jun National Key Lab. Of Surface Engineering, Lanzhou Institute of Physics, Lanzhou 730000, China Abstract:A method of mask for adjusting the thin film thickness design was described. Relation between the film thickness on the substrates and that on the chips was analyzed when a mask is used. The mask for linear variable filters was designed. Some linear variable filters were successfully fabricated and the results Were given.[著者文摘]
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6 K5 l, q9 `' t; l+ W. M/ s- ZKey words:film thickness; modifying mask; design |
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