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Design and simulation of antireflection coating

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发表于 2007-6-10 04:46:01 | 显示全部楼层 |阅读模式
[/free]Design and simulation of antireflection coating
Reflectancecalculationforvarioussingle-,double-andtriple-layer Antireflection coatings
(ARCs)onsiliconsubstratearepresented.Acalculationprogramisdevelopedtodeterminethe
optimumthicknessandtherefractiveindexofeachlayeratasinglewavelengthforoptoelec-
tronicapplicationsandthroughthevisiblespectrumforphotovoltaicapplications.
Ta O , ZnS, Al O singlelayer,MgF /ZnsdoublelayerandMgF /Al O /ZnStriplelayer
ARCsystemsaredepositedonsiliconsubstrateusingelectronbeamandthermalevaporation
asdepositiontechniques.ThereflectanceasafunctionofthewavelengthofARcoatingsystems
onsiliconsubstrateismeasured.Allcurvesshowgoodaccordancebetweenthetheoreticaland
theexperimentalreflectance.Asapplicationinthephotovoltaicfield,aZnSsingle-layerAR
coatingisevaporatedonconcentratorsiliconsolarcells.Spectralresponseandcurrent—voltage
characteristicsaremeasuredbeforeandafterZnSARCdepositiontoestimatetheimprovement
ofthecellperformances.Short-circuitcurrentandcelle?ciencyareincreasedbyabout31%
and29.4%,respectively. 1998ElsevierScienceB.V.Allrightsreserved.
Keywords: Antireflectioncoating;Optoelectronicdevices;Siliconsolarcells[free]
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