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Thin-film multilayer design optimization using a Monte Carlo. c p: v+ @$ X+ f) {. ^3 c& D
approach( |* }# S/ ]: [$ X. x* J
W. J. Wild and H. Buhay
i1 i! m* r# O% UMicrowave & Electro-Optics Department, IIT Research Institute, 10 West 35th Street, Chicago, Illinois 60616/ V! L( s" q! _9 u
Received April 23, 1986; accepted August 8, 1986: z$ E* [* C! m! G2 }2 l0 ]
An iterative Monte Carlo thickness-varying strategy is presented and used to optimize normal-incidence thin-film
0 t4 n( C; V' V6 j' Hmultilayer designs and demonstrated for a variety of circumstances. The technique does not get trapped in local* a; g L2 {" Y& y
minima and, in principle, can home in on the best global design. |
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发表于 2007-3-16 04:18:08
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