Materials selection for thin films for radio frequency

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Materials selection for thin films for radio frequency
) T- T: K# V3 h) T+ D# V  g3 Cmicroelectromechanical systems
G. Guisbiers *, O. Van Overschelde, M. Wautelet
0 V0 B* u3 p8 p3 i9 {2 LPhysics of Condensed Matter, University of Mons-Hainaut, 23 Avenue Maistriau, 7000 Mons, Belgium
Received 16 August 2005; accepted 6 April 2006
Abstract
) i/ n3 i' u) uMaterials selection is an important subject in microtechnology. The methodology developed by Ashby is used here. It is shown that it
can be applied easily to microelectromechanical systems (MEMS). Firstly, a selection concerning a minimization of intrinsic residual
: v6 r' f  h. {& Z* X4 Nstresses for thin films deposited by evaporation process is presented. Secondly, the selection of materials to serve in the design of the
bridge of a MEMS-RF switch and a MEMS-RF varicap (variable capacitor) is considered.
 2006 Elsevier Ltd. All rights reserved.

duanjun2000

是楼主自己写的吗？