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Influence of negative ion element impurities on laser induced
$ _# L4 ]2 L# @damage threshold of HfO2 thin film* d9 I, T7 z/ @* y2 b; R5 B
ShiGang Wu a,b,*, GuangLei Tian a,b, ZhiLin Xia a,b, JianDa Shao a, ZhengXiu Fan a" L2 ^# r8 \$ @: W1 Q( n1 C2 G, M
a Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
9 [# L5 x# R+ i& `, W2 Kb Graduate School, Chinese Academy of Sciences, Beijing 100080, China
" E9 z" v" I" Q7 }" A0 |4 SReceived 8 October 2005; received in revised form 18 January 2006; accepted 22 January 20060 I$ _7 S% A( _! M1 C2 ?7 e
Available online 6 March 2006; z+ D7 [9 Q8 ]
Abstract
7 S' C q# D" S. }* ?; fNegative ion element impurities breakdown model in HfO2 thin film was reported in this paper. The content of negative ion elements were) e3 h4 S& j+ I' |3 g
detected by glow discharge mass spectrum analysis (GDMS); HfO2 thin films were deposited by the electron-beam evaporation method. The weak
, R* \0 B2 P: R8 N: [( T% G- N Pabsorption and laser induced damage threshold (LIDT) of HfO2 thin films were measured to testify the negative ion element impurity breakdown8 [1 h2 t; u' m2 l) y6 m) ?( S x0 L- L
model. It was found that the LIDT would decrease and the absorption would increase with increasing the content of negative ion element. These: x5 r4 @0 X% M! b& H
results indicated that negative ion elements were harmful impurities and would speed up the damage of thin film.
, G0 y0 Q0 b9 T# Y; l# 2006 Elsevier B.V. All rights reserved.
) |3 s# D2 A6 T+ gPACS: 68.55.Ln; 81.70. q
; y, }: S- F7 d0 Y- @0 ~Keywords: Negative ion elements; Impurities breakdown model; HfO2 thin film; Weak absorption; LIDT |
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