|
高损伤阈值三倍频分离膜王孝东[1,2] 张锦龙[1,2] 马彬[1,2,3] 焦宏飞[1,2,3] 丁涛[1,2] 程鑫彬[1,2][1]同济大学精密光学工程技术研究所,上海200092 [2]上海市特殊人工微结构材料与技术重点实验室,上海200092 [3]同济大学航空航天与力学学院,上海200092摘 要:设计了Nd:YAG激光用三倍频分离膜,膜层材料为SiO2和HfO2。经过优化,膜系在355 nm处的反射率在99%以上,在532 nm和1 064 nm处透射率也在99%以上。采用电子束蒸发技术,在熔融石英基底上制备了样品,经测量,制备的分离膜光学性能与设计值接近。分离膜在355 nm激光辐照下的损伤阈值为5.1 J/cm2,并用微分干涉显微镜表征了薄膜损伤形貌。[著者文摘]
) Q3 i4 U, g/ s* X( R" j8 E5 `( N; c$ m4 f% a) n
关键词:三倍频分离膜 电子束蒸发 激光损伤阈值 光学薄膜; ? T: P- p$ u4 f. s4 ]' K& D
0 D% n/ N& H! Q; N1 R分类号: O484.4[著者标引]) ^3 x# z" h" m
文献标识码:A
- l6 }: U: l! g2 w' ^( x5 S4 l9 T文章编号:1001-4322(2011)07-1882-03! i: ?6 t2 ^$ V
栏目信息:ICF与激光等离子体. K3 b: P2 C$ s4 J4 n
3 B0 |; w& M. a) |5 v7 }6 {" A相关文献:主题相关 全文快照
$ y. M8 V; |! W- z9 X, y% o8 u* m7 a( X) |# r
( r& ^" W4 O, |
Third harmonic separator with high laser-induced damage thresholdWang Xiaodong,Zhang Jinlong,Ma Bin,Jiao Hongfei,Ding Tao,Cheng Xinbin,1.Institute of Precision Optical Engineering,Tongji University,Shanghai 200092,China;2.Shanghai Key Laboratory of Special Artificial Microstructure Materials and Technology,Shanghai 200092,China;3.School of Aerospace Engineering and Applied Mechanics,Tongji University,Shanghai 200092,ChinaAbstract:Using electron beam evaporation,a 355 nm separator was designed by depositiing SiO2 and HfO2 alternatively.The coating has a reflectivity of larger than 99% at 355 nm through optimization and a transmittance larger than 99% at 532 nm and 1 064 nm.It has good electric-field distribution.The spectra of the fabricated coating is close to the designed one.The laser-induced damage threshold of the coating is 5.1 J/cm2.Morphology of laser-induced damage of the coating was characterized by differential interference contrast microscope.[著者文摘]$ `1 }4 Z$ |* b* }) V
- m% C- W2 H1 |( r
Key words:third harmonic separator; electron beam evaporation; laser-induced damaged threshold; thin film) i0 ~. L8 H; v
7 V, B; G2 E3 E0 e
, I7 |+ O0 L6 I8 E( S* b
0 T8 \ j' ^' J6 V* S0 \
|
本帖子中包含更多资源
您需要 登录 才可以下载或查看,没有帐号?注册
x
|