TiO2薄膜折射率的调控方法

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TiO2薄膜折射率的调控方法 摘　要:采用电子束蒸发技术及其辅助工艺制备了TiO2薄膜,利用X射线衍射（XRD）、X射线光电子能谱（XPS）和原子力显微镜（AFM）对薄膜的组织结构进行了表征,采用紫外可见分光光度计研究了TiO2薄膜的折射率变化.结果表明：传统电子束蒸发镀制的TiO2薄膜的折射率低于块体值,通过调节氧气压、沉积速率和衬底温度可在1.97～2.22范围内调控其折射率;采用离子束辅助轰击可使薄膜致密化,获得折射率在2.06～2.42范围内变化的TiO2薄膜;利用斜角入射沉积可控制薄膜生长角度与孔隙率,实现折射率在1.71～2.18范围内的调控.[著者文摘]

关键词:薄膜 折射率 电子束蒸发
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分类号:　O484.41[著者标引]
1 s. Q" M/ U" s4 ]" a文献标识码：A
文章编号：1674-2974（2011）09-0059-05
6 U, l4 ?& y/ X# g. ~8 E, o/ o栏目信息：材料科学
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相关文献:主题相关 全文快照　　　
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% z7 i+ e/ P" Y' _Regulation of the Refractive Index of TiO_2 FilmsZHOU Ling-ping,LUO Xiao-lan,ZHU Jia-jun,PENG Kun,LI De-yi,LI Shao-luCollege of Materials Science and Engineering,Hunan Univ,Changsha,Hunan 410082,ChinaAbstract:TiO2 films were prepared by electron beam evaporation（E-beam）.X-ray diffraction（XRD）,X-ray photoelectron spectroscopy（XPS） and atomic force microscope（AFM） were applied to characterize the film＇s structure.UV-visible spectrophotometer was used to analyze the changes of refractive index（RI）.It has been found that the RI of TiO2 film prepared by E-beam is lower than that of the bulk.It can be regulated within 1.97~2.22 by controlling O2 pressure,deposition rate and substrate temperature.Compact film with RI within 2.06~2.42 is obtained by ion beam assisted deposition.Glancing angle deposition can realize the regulation of RI within 1.71~2.18 by controlling the growing angle and the porosity of films.[著者文摘]

Key words:films; refractive index; electron beam evaporation
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( [6 _% ]7 Q( i# P: X' a' P6 ?TiO2薄膜折射率的调控方法.rar


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