紫外Sc2O3薄膜的光学和结构性能表征及其激光作用下的损伤机理

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紫外Sc2O3薄膜的光学和结构性能表征及其激光作用下的损伤机理
刘光辉[1,2] 薛春荣[1,2] 晋云霞[1] 张伟丽[1] 方明[1] 贺洪波[1] 范正修[1][1]中国科学院上海光学精密机械研究所,强激光材料重点实验室,上海201800 [2]中国科学院研究生院,北京100039摘　要:利用电子束蒸发方法,在不同沉积温度（50～350℃）下制备了Sc2O3薄膜。分别用分光光度计,小角掠入射X射线衍射仪和轮廓仪测试了薄膜样品的光谱、微结构和表面粗糙度信息,并用薄膜分析软件Essential Macleod计算了Sc2O3薄膜的折射率和消光系数。结果表明：随着沉积温度升高,Sc2O3薄膜结晶程度增强,晶粒尺寸增大,且较高的沉积温度有利于获得较高的折射率。最后用355 nm,8 ns的三倍频Nd：YAG激光器测试了其激光损伤阈值（LIDT）,最大值为2.6 J/cm2,且阈值与薄膜的消光系数、表面粗糙度、光学损耗均呈现相反的变化趋势。用光学显微镜和扫描电子显微镜表征了该薄膜的破坏形貌,详细分析了薄膜在不同激光能量作用下破坏的发展过程,以及Sc2O3薄膜在355 nm紫外激光作用下LIDT与制备工艺的关系,重点分析了355 nm激光作用下薄膜的破坏机理。[著者文摘]

7 A7 @/ L" P! K关键词:Sc2O3薄膜 沉积温度 光学性能 结构性能 激光损伤阈值 破坏机理
+ Z/ k$ i8 S$ T; x2 @分类号:　O484.4[著者标引]文献标识码：A文章编号：1001-4322（2010）08-1766-05栏目信息：第十九届全国激光技术会议专辑
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- z9 Y* \# h+ v8 E  Z- FCharacterization of optical and microstructure properties of ultraviolet Sc_2O_3 thin films and their damage mechanism at high laser powerLiu Guanghui,Xue Chunrong,Jin Yunxia,Zhang Weili,Fang Ming,He Hongbo,Fan Zhengxiu1.Key Laboratory of Materials for High Power Lasers,Shanghai Institute of Optics and Fine Mechanics,Chinese Academy of Sciences,Shanghai 201800,China;2.Graduate University of Chinese Academy of Sciences,Beijing 100039,ChinaAbstract:The electron beam evaporation deposition method was employed to prepare scandium oxide（Sc2O3） films with substrate temperatures varying from 50 to 350 ℃.A spectrophotometer,a glancing incidence X-ray diffraction spectrometer and a WYKO optical profilograph were employed to investigate the optical,microstructure properties and surface roughness of the Sc2O3 films.The refractive index and the extinction coefficient were calculated from the transmittance and reflectance spectra with the help of the Essential Macleod.The laser induced damage threshold（LIDT） of the Sc2O3 films was characterized by a pulsed Nd：YAG laser system at 355 nm with a pulse duration of 8 ns.A maximum value of 2.6 J/cm2 was derived,and the LIDT results were found to vary in the opposite direction to the extinction coefficient,surface root mean square roughness and optical loss of the Sc2O3 films.An optical microscope and a scanning electron microscope were used to characterize the damage morphology of the samples,and the development of damage with increasing laser energy density was recorded and discussed.The relationship between the LIDT and the deposition parameters of the Sc2O3 thin films was analyzed,and the damage mechanism of the films under 355 nm laser irradiation was discussed.[著者文摘]

Key words:Sc2O3 thin films; substrate temperature; optical properties; microstructure properties; laser induced damage threshold; damage mechanism

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谢谢楼主的好资料