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1315 nm高反射率硅镜的膜系分析‘
4 Q9 |$ a( z8 u. Q# q3 R2 }彭玉峰程祖海张耀宁周次明杨春华 * R+ V* i, {0 t4 v( z# M
(华中科技大学激光技术国家重点实验室,武汉430074)
% p- l, N0 w, J9 A提要利用TFCALC薄膜设计软件包对TiQ/SiO-TaiOsISO,和S/Sio,膜系中心波长为1315- 的硅镜反射特 ' T! H6 S6 u* [# z; `
性进行了仿真模拟。给出了正人射与45'斜入射情况下三种膜系硅镜的反射特性,并进行了分析与讨论。
# Z/ s% i' t& |( W( ]- G关健词化学氧碘激光器,硅镜,高反射率,薄膜
8 b: C |1 l% Y/ @, ~中圈分类号0484.5 文献标识码A ; s& d* q: S6 i1 y9 ~5 d! [5 H. v
Analyses of Si-mirror Film Systems with High Reflectance at 1315 nm
2 {: P6 u& ~! U7 [4 R2 x1 B7 b9 ]PENGY u-feng CHENG Zu-hai ZHANGY a-oning ZHOU Ci-ming YANG Chun-hua . I9 h! z+ \8 Z4 o% [
?Yational Key Laboratory for Laser Technology,H-zhong Unirrrsity of Science and Tech-log ,Wthan 430074
- U0 r- }/ \! j% u7 }/ z# hAbshxt Reflectancep ropertieso fsi limrtm irrorsw ithT iO,/SO,.,T ar05/&O,,andS ifSiO,fi lm systemsa t1 315n m / P0 J9 l2 O' q: b/ q
are manericaly analyzed, and disrvssed under conditions of normal and 45' tilt angle incidence, respectively. The results
+ T/ B0 u/ G# n6 V0 _- p& V1 H5 lshowt hatre flectancep ropertiesof T iO,/SOran dT a,q渴qaresi milar;th eoreticalre flectivityis le ssth an9 9.9596fo r ]1 ^* f4 Z* `4 \# K
1315 nm laser wavelength. Theoretical reflectivity of Si(c)/SiQ stack can be more than 99.9996
% t! c% E* r/ c2 C. U, k1 I2 ?6 {. |Keyw ards CO IL,s itiornm irorrs,fi lm,h ighr eflectivity |
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