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薄膜资料(Thin film Material)连续送第2部分!(前言)

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发表于 2006-3-11 08:16:31 | 显示全部楼层 |阅读模式
Preface
' b: ~" v1 J7 I4 p( eWithin a period of a few decades, the ¯eld of materials science and engineering: j4 W  n# [0 f/ g% }
has emerged as a focal point for developments in virtually all areas) D' H0 k3 s  `
of engineering and applied science. The study of thin film materials has
" D' z3 s9 `2 @# m- @' _( d8 ]been one of the unifying themes in the development of the ¯eld during this
" H. I. k3 ^; o% M* m2 w, Dperiod. As understood here, the area encompasses ¯lms bonded to relatively
0 w5 _0 k6 r+ U6 V+ C' \. F. ethick substrates, multilayer materials, patterned ¯lms on substrates
2 Y) L# O2 l3 V1 z( k5 nand free-standing ¯lms. Signi¯cant advances in methods for synthesizing" k2 S1 X$ N) ]3 O
and processing these materials for ever more speci¯c purposes, as well as in7 q: v' Z. d6 m
instrumentation for characterizing materials at ever diminishing size scales,7 Q, l( D3 P4 ?: x/ P  q5 D" {/ U
have been key to modern engineering progress.5 @0 N1 I% f& `/ q
At the dawn of the 21st century, the United States National Academy
5 x9 ?' q, q( Y- W  `of Engineering reported the outcome of a project intended to identify the
& b/ e; o8 z+ C, h; h- i+ vtwenty most signi¯cant engineering achievements of the preceding century.
5 _8 e: u% q" u2 F6 E* f' CIt is evident from the list compiled that achievements of the second half. ~. x4 G  v  I8 u8 q
of the twentieth century { electronics, computers, health technologies, laser
3 S. e- {, {( j! nand ¯ber optics, for example { were all based on the creative and e±cient( C. w2 H+ X+ C7 X
exploitation of materials; thin ¯lm materials represent a major component
2 e7 s$ z) P7 _( y' G9 e) ?of this advance in materials technology. In fact, the impact of advances: |/ t! N  |$ k. s& o
in the specialized uses of materials was so pervasive in the achievements$ ^  \6 p( x! [/ e2 K. y
being recognized by the Academy that the development of high-performance
: r4 F0 O! s' Dmaterials itself was included as one of the most signi¯cant achievements./ m4 i. j' ]' U* H. k
The goal of this book is to summarize developments in the area of thin0 z. p# b. `, o
¯lm materials that have occurred over the past few decades, with emphasis) N2 `. e8 m& o1 a: Q4 @
on the generation of internal stress and its consequences. Internal stress can0 _7 ^2 _$ b: A' Q8 V9 b
induce a variety of undesirable consequences including excessive deformation,& `8 \8 s; _- F$ L3 {
fracture, delamination, permanent deformation and microstructural
2 z7 z/ C5 t4 y) l; V* |$ ?, }alterations. In spite of these possibilities, thin ¯lms have been inserted
6 v2 q* c" ^7 Uinto engineering systems in order to accomplish a wide range of practical
& D+ |$ v! S: v& v, `7 x  h. m+ wxv
8 m2 U& X; d6 U0 V+ A& K* ?. {- r- B* Lxvi Preface0 K5 q( C6 ~  U$ A* F7 C3 g
service functions. Among these are microelectronic devices and packages;. U4 L- I/ }  {, D  ~
micro-electro-mechanical systems or MEMS; and surface coatings intended' c4 R) ?, t; F
to impart a thermal, mechanical, tribological, environmental, optical, electrical,
6 L* l4 i  R  o& |magnetic or biological function. To a large extent, the success of this
+ Q$ w$ H8 q1 C3 u7 L, i4 A6 wendeavor has been enabled by research leading to reliable means for estimating$ f# V! C  m8 o7 \3 `1 r: x
stress in small material systems and by establishing frameworks in7 J& k6 T2 _' w1 U2 E5 o
which to assess the integrity or functionality of the systems. The prospect# `1 W6 l6 B; d- m$ l# E
for material failure due to stress continues to be a technology-limiting barrier,
6 Z: q; E. u: ^9 P8 y# v' E- f/ seven in situations in which load-carrying capacity of the material is not
# V( E- J: @9 A1 c0 G3 F8 g2 kamong its primary functional characteristics. In some circumstances, stress
' [0 E# ^2 ?1 G, {6 U- L, }. K& Z) Chas desirable consequences, as in bandgap engineering for electronic applications3 e; r  C3 t1 b8 b4 k' d
and in the self-assembly of small structures driven by stored elastic4 i6 f: |& D) i8 K, S, N, P. |
energy. It is our hope that the information included in this book will be& I' {; i, ~+ e& y
useful as an indicator of achievements in the ¯eld and as a guide for further
! ?! {# F* `" k! l8 Dadvances in a number of new and emerging directions.
3 x- j$ j: p) k" D! q# |4 E1 \The ¯rst chapter is devoted largely to a discussion of the origins of
1 |" s2 R$ P' R, t  ~% }* I8 vresidual stress in thin ¯lm materials and to identi¯cation of relationships
0 K) @( n! o3 Dbetween processing methods and generation of stress. The consequences of# ^) ^* L$ E# n5 a
stress are discussed in subsequent chapters, with the presentation generally& Z0 r/ @/ o' P/ z( _& F3 ?* K
organized according to the size scale of the dominant physical phenomena! Y8 C: @+ i; E3 w. \: @4 O
involved. Overall deformation of ¯lm-substrate systems or multilayer structures
9 A1 j2 M4 G- e2 `& p% B; R' Kare considered in Chapters 2 and 3. This is followed by examination& m- G9 g( y; W6 C4 k
of the general failure modes of fracture, delamination and buckling of ¯lms
! k- d2 f" C+ {2 V& [in Chapters 4 and 5. The focus then shifts to a smaller scale to discuss# Q6 i4 ^% Y# g) v5 A& ?) P( G9 [
conditions for dislocation formation in Chapter 6 and inelastic deformation
9 I" E, E; j, D3 nof ¯lms in Chapter 7. Finally, the issues of stability of material surfaces; B3 `1 ?* z3 l8 r5 w( E! v
and evolution of surface morphology or alloy composition are considered in
& E9 k0 E! U* r9 }Chapters 8 and 9. The consequences of stress in thin ¯lms is linked to the4 M+ w9 m& |& F. J
structure of the ¯lm materials wherever possible.) J! G9 C9 P' U0 K5 {' C1 }3 m
It is recognized that each of the principal topics covered in the book7 p1 P% f! S, H% U. h) B
could itself be developed into a substantial monograph, but the goal here
/ ]' }' I4 a- s6 d% v% Mis not the exhaustive treatment of a topic of limited scope. The area is7 V9 k, Y; D+ A2 t
inherently interdisciplinary, and the intention is a provide a comprehensive9 b( J6 g/ v; T: e
coverage of issues relevant to stress and its consequences in thin ¯lm materials.
2 W3 }. m6 q/ e! H% qAdoption of this approach meant that many choices had to be made) |2 |' Z& C! ~: l
along the way about depth of coverage of speci¯c topics and balance among
+ k9 J4 |+ T" O7 V6 o9 R6 Z2 Fdi®erent topics; we hope that the readers will judge the choices made to be! @' h8 q& n7 B/ f: v2 z
reasonable. The main purpose of the book is the coherent presentation of
7 Y. B2 T* x4 Z4 Kthe sound scienti¯c basis for describing the origins of stress in ¯lms and for8 I" b* D7 O- n  {* c" k( @0 ]
anticipating the consequences of stress in defect formation, surface evolution' O7 g5 A$ V# w5 P& h; p. Q' Q  f
Preface xvii/ w! T$ W2 W2 ]9 [3 w# G9 N
and allied e®ects. Many references to original work are included as a guide; W- z" _# H& E5 Q3 S
to the archival literature in the area. In addition, the fundamental concepts6 R4 W( G* H$ f( [
developed are made more concrete through implementation in sample calculations( w8 K* F, m5 l! Z; ]  M  B
and through discussion of case studies of practical signi¯cance. The( H( T% H# ?+ H, P4 P- K! M
description of experimental methods, results and observations is included
% f" L- R* k$ a# M3 i7 Y8 x; has an integral part of developing the conceptual structure of the topics examined.
$ h( h9 e7 p7 ~* _1 t+ G+ FEach chapter concludes with a set of exercises that further extend$ C+ r! q* o* ^: n% s* X2 w$ E7 U
the material discussed, and which can challenge newcomers to the area at8 _- T5 D# l0 z% V: A# z  f  b
applying concepts. It is our hope that, with this structure, the book will+ P" q/ I4 o5 |. p7 }% c7 M1 P+ w
serve as a research reference for those pursuing the area at its frontiers, as a
+ ]+ ?+ C8 t8 ~3 a7 p* Ruseful compilation of readily applicable results for practicing engineers, and; j8 s( C2 }( b# q9 c( \
as a textbook for graduate students or advanced undergraduate students" x8 Q) \8 ]: H5 F2 D
wishing to develop background in this area.
; S6 Y# o9 P# U1 W9 m, y4 h6 dThe idea for the book grew out of a course on thin ¯lms that has
4 G3 h% h* B' t# W$ i, J! m5 S4 vbeen o®ered for students in solid mechanics and materials science at Brown; p+ b4 P! J9 o. V. T
University since 1992, as a natural outgrowth of emerging research activity
2 m. t( @- @3 Ein the area. We are grateful to the many students, postdoctoral research
" o8 K9 Y0 i  Q; e  F; ]8 Kassociates and colleagues who attended these lectures and whose enthusiasm
4 |. B7 C  O8 u, x$ l: A; w6 Fgave this project its initial impetus.0 p8 V( M( m* e0 D' K( K: N( ~
We are also grateful to many colleagues who have contributed in various) b/ m+ v3 A& [
ways to the preparation of this book. We particularly thank John3 K8 G9 P7 d2 A+ l6 L
Hutchinson who used a draft of parts of the book for a course for graduate0 @+ D0 j$ |. D0 Q; @+ ]
students at Harvard and MIT, and who provided valuable feedback on this
3 A, t/ s6 ]: o8 x, M7 `) a+ \material. Both John Hutchinson and Bill Nix kindly shared with us their
; o  x1 q( F( A0 o$ K8 [0 _) Q( `4 u  nown course materials on thin ¯lms. Several colleagues read drafts of various$ ^4 K  s3 e; d- [* a* y
sections of the book and o®ered helpful recommendations; they include
: M) h8 }/ Z) G7 cIlan Blech, Eric Chason, Ares Rosakis, Vivek Shenoy and Carl Thompson.+ y% q0 E6 }/ s% c( x0 v9 |) n- t
Several graduate students who took courses based in part on draft chapters,2 X, @7 m* \! K0 ]9 C5 r
particularly Yoonjoon Choi and Nuwong Chollacoop, suggested a number of9 k; F4 t2 L4 p& J0 t/ {" Q
clari¯cations and improvements in the presentation. Finally, we are grateful
3 ]; _/ L# v# Lto the many colleagues who provided ¯gures and micrographs from their# w' _5 n) e$ b- S5 q7 E# F
own work; in these cases, acknowledgments are noted along with the included
! K& K# q6 |6 x8 R  `material. Tim Fishlock at Cambridge University Press o®ered us5 Y0 _6 ~; [* \0 Z- k# A
considerable °exibility in the formulation of the scope of this book and in2 q, K9 G" d7 j
the preparation of the document.  O- Z+ ]0 l1 k/ t2 f
LBF is grateful to the Materials Research Science and Engineering
. O! q* H: I) D# d; U5 J1 BCenter, funded by the National Science Foundation at Brown University,  b7 a3 d$ v5 {
for long-term support of research in the general area of thin ¯lms and for: M: P; y4 C0 y3 c1 i
the collaborations fostered through the Center. He is also thankful to the$ ^) M# H6 p" L- I+ ?$ G& u& @
Division of Engineering and Applied Sciences at Caltech for hosting a sabxviii2 V0 Z" ^# ~9 x9 Q' r
Preface
. X4 b" r5 F5 W! V6 O5 y9 Sbatical leave; the kind hospitality and congenial environment a®orded an/ ?6 p3 I& C* \: E) X7 q% |
opportunity for pursuing the book writing project at its early critical stage.# Y. M; e5 _. C1 ~! f' T& I
SS is grateful to the Defense University Research Initiative in NanoTechnology,
- a  }- `/ R! A5 G! D5 \- C* Qfunded by the O±ce of Naval Research at MIT, and the Programme on. c9 q' ~: @& E% l
Advanced Materials for Micro and Nano Systems, funded by the Singapore-
5 W: F, L8 G0 o) Q3 q# dMIT Alliance, for their ¯nancial support for research in the areas covered( u$ G2 j  s* j& n! N# \
by the book., P( d, R- z) ^% l4 }1 C; |
A project of this magnitude would not have been possible without3 E  r2 M3 R% w4 ~5 t: ~5 O3 Z& k- E
the support and encouragement of the members of our families. We are. y; Z; d5 O, K6 N3 P" e  [
extremely grateful for their enduring patience and understanding during
/ p8 z+ L1 }+ h" n$ p; |; P/ }; iour long hours of immersion in this project over the past several years., \8 o( M  D% U, o3 D5 n! j
L. B. Freund and S. Suresh# g1 T1 H* v7 C6 _
January 2003
发表于 2006-4-11 22:27:45 | 显示全部楼层
顶啊
发表于 2006-4-12 04:06:58 | 显示全部楼层
好象这里挺热闹的。
发表于 2006-4-12 04:08:52 | 显示全部楼层
确实不错,支持
发表于 2006-4-12 04:09:19 | 显示全部楼层
应该还有后文吧
发表于 2006-4-12 04:09:51 | 显示全部楼层
期待楼主的新帖
发表于 2006-4-13 23:41:59 | 显示全部楼层
我顶
发表于 2006-4-15 10:43:33 | 显示全部楼层
谢谢楼主,收藏了
发表于 2006-4-23 23:22:00 | 显示全部楼层
楼主何不做个好事,把书发出来,让我们来下载呀
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