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薄膜资料(Thin film Material)连续送第2部分!(前言)

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发表于 2006-3-11 00:16:31 | 显示全部楼层 |阅读模式
Preface! S2 p; k/ V3 C2 e
Within a period of a few decades, the ¯eld of materials science and engineering. ?7 {- m% i7 ^& M' v, M# S5 }% K
has emerged as a focal point for developments in virtually all areas
& v  c2 H: M" l( j# ~of engineering and applied science. The study of thin film materials has
" D2 [6 Q: |, sbeen one of the unifying themes in the development of the ¯eld during this
# I. j8 Q7 n( K/ Z  Z5 r0 Wperiod. As understood here, the area encompasses ¯lms bonded to relatively9 L3 s; `* K8 i/ ?* N0 p8 m1 m: [
thick substrates, multilayer materials, patterned ¯lms on substrates
: `% s4 N3 N# J) y8 d4 [and free-standing ¯lms. Signi¯cant advances in methods for synthesizing
8 S% T' p: v$ l" `/ _and processing these materials for ever more speci¯c purposes, as well as in
+ U% ^. W: W+ Q3 \3 W/ J5 ?instrumentation for characterizing materials at ever diminishing size scales,  ?8 W, k- U! S5 a' ~
have been key to modern engineering progress.
- X) M" V& g" N: V. H) |At the dawn of the 21st century, the United States National Academy
7 f1 b3 i) S# z9 ^of Engineering reported the outcome of a project intended to identify the
3 N+ \6 H, J/ dtwenty most signi¯cant engineering achievements of the preceding century.8 G3 f6 z1 W" N. n7 E# g
It is evident from the list compiled that achievements of the second half
# h+ x8 @3 |4 ^; O/ f4 o3 Uof the twentieth century { electronics, computers, health technologies, laser
+ `$ l4 p# x8 X7 K+ r( k. b, M# Tand ¯ber optics, for example { were all based on the creative and e±cient6 L7 @% D, }1 X
exploitation of materials; thin ¯lm materials represent a major component( M+ N2 Z" z" `
of this advance in materials technology. In fact, the impact of advances/ o$ f- V3 [; w/ v# ?5 |- \
in the specialized uses of materials was so pervasive in the achievements" v3 s2 Q! c: O$ l6 r
being recognized by the Academy that the development of high-performance
7 f2 N# p6 E3 \8 }materials itself was included as one of the most signi¯cant achievements.  H. e- M  i& q: z4 E
The goal of this book is to summarize developments in the area of thin, d- ]& {; A! p
¯lm materials that have occurred over the past few decades, with emphasis
$ b2 i* w$ f. J; Pon the generation of internal stress and its consequences. Internal stress can
; o: q$ T' V- |8 Z1 ~: Vinduce a variety of undesirable consequences including excessive deformation,( E$ |: {6 L0 R
fracture, delamination, permanent deformation and microstructural
: v- C, j/ c; |( halterations. In spite of these possibilities, thin ¯lms have been inserted: {9 J; u% Z' K( _' K# K6 r
into engineering systems in order to accomplish a wide range of practical
6 n; |+ o) F  V. i4 ?; Wxv
' H' d2 j+ @& D. j* P1 Q9 Fxvi Preface
! H0 {' H" `; m* x( @5 w2 |+ Pservice functions. Among these are microelectronic devices and packages;3 i- B. U" v; o' E0 ^4 O: ~2 K
micro-electro-mechanical systems or MEMS; and surface coatings intended
. c  K) W+ o7 U" p3 Q0 \to impart a thermal, mechanical, tribological, environmental, optical, electrical,
; I' {  k$ j1 f8 W0 p. Wmagnetic or biological function. To a large extent, the success of this
0 D. x4 g2 ]) i+ V! Y* m4 {endeavor has been enabled by research leading to reliable means for estimating
2 j$ G' B* X+ f$ U: jstress in small material systems and by establishing frameworks in
/ L0 W4 K" M" ?7 a/ n4 B' p  ewhich to assess the integrity or functionality of the systems. The prospect
/ }6 F" e! K. y1 `for material failure due to stress continues to be a technology-limiting barrier,
9 r7 h8 W2 b' g$ V& P' ~( j9 `even in situations in which load-carrying capacity of the material is not1 _3 W1 g% L7 ~% {
among its primary functional characteristics. In some circumstances, stress
- P9 m( V& K, Y0 y, _9 H8 h- }has desirable consequences, as in bandgap engineering for electronic applications- C. l9 D, P( N" x% p
and in the self-assembly of small structures driven by stored elastic5 S# X/ F4 G7 g# }1 {
energy. It is our hope that the information included in this book will be
% [4 j5 E5 ]) D0 s( wuseful as an indicator of achievements in the ¯eld and as a guide for further* M9 K$ j  j2 V- P$ u, |2 V
advances in a number of new and emerging directions.
% X& F5 V/ [% OThe ¯rst chapter is devoted largely to a discussion of the origins of- P9 d4 Y0 m$ j& ?! z7 L
residual stress in thin ¯lm materials and to identi¯cation of relationships
6 a4 @# o7 ?! m. |between processing methods and generation of stress. The consequences of
" a7 F; ^3 A1 M) y3 x- K5 T' o/ jstress are discussed in subsequent chapters, with the presentation generally
% w4 P) T8 a! p" S( @& Zorganized according to the size scale of the dominant physical phenomena
" n3 \1 M* ]* m" jinvolved. Overall deformation of ¯lm-substrate systems or multilayer structures# u+ R. x, P+ I( F( l
are considered in Chapters 2 and 3. This is followed by examination
4 x- [0 R& t& Z) i# s, wof the general failure modes of fracture, delamination and buckling of ¯lms
# Z$ x/ Y: v/ I( Rin Chapters 4 and 5. The focus then shifts to a smaller scale to discuss* X# J- W2 w$ A) V
conditions for dislocation formation in Chapter 6 and inelastic deformation
4 E8 R) B: t, ~  s: a( }" r  [of ¯lms in Chapter 7. Finally, the issues of stability of material surfaces: d+ c: m$ q1 {9 u- L
and evolution of surface morphology or alloy composition are considered in
/ {$ g7 H; o3 a1 [) P4 |% E9 jChapters 8 and 9. The consequences of stress in thin ¯lms is linked to the. I6 m- \5 b) Y: ?3 x! S3 F. P; @
structure of the ¯lm materials wherever possible.9 ^8 q8 P# t: ?7 N
It is recognized that each of the principal topics covered in the book; p& F( C3 z( u
could itself be developed into a substantial monograph, but the goal here! P' F) l; E* F, D& |9 O+ j9 z
is not the exhaustive treatment of a topic of limited scope. The area is) y8 m+ P5 ^* F
inherently interdisciplinary, and the intention is a provide a comprehensive
6 K' m% F, f6 j" {4 ecoverage of issues relevant to stress and its consequences in thin ¯lm materials., s, V: p6 I/ i
Adoption of this approach meant that many choices had to be made
4 `+ u; M8 R* F% W& Kalong the way about depth of coverage of speci¯c topics and balance among- e' p% k( ?6 ^  q+ {
di®erent topics; we hope that the readers will judge the choices made to be
6 f( R2 |6 O# _reasonable. The main purpose of the book is the coherent presentation of
- n, z0 ~+ n5 @2 n( |the sound scienti¯c basis for describing the origins of stress in ¯lms and for0 k6 F9 ?: G/ e5 T4 i' @
anticipating the consequences of stress in defect formation, surface evolution8 ~. K: g4 c% v6 r
Preface xvii- v* J% O3 ?$ g, ^/ `! }
and allied e®ects. Many references to original work are included as a guide6 j9 a9 {! X! k* u- R
to the archival literature in the area. In addition, the fundamental concepts
$ T; M  Z( I8 i8 a7 adeveloped are made more concrete through implementation in sample calculations/ |3 c: ]1 b8 {+ m
and through discussion of case studies of practical signi¯cance. The
8 I% K" C  U' g" Qdescription of experimental methods, results and observations is included0 l. q+ I2 y+ c5 c3 b6 D! `
as an integral part of developing the conceptual structure of the topics examined.
% k! J% A) y: C2 |6 D. HEach chapter concludes with a set of exercises that further extend; c1 \. j; d% i4 d( E9 [
the material discussed, and which can challenge newcomers to the area at9 ~; E- ?: C7 u1 n
applying concepts. It is our hope that, with this structure, the book will1 [9 u4 r2 b4 D
serve as a research reference for those pursuing the area at its frontiers, as a% t0 O" ?& [) g3 ^
useful compilation of readily applicable results for practicing engineers, and: v9 }: c+ a6 ]5 O
as a textbook for graduate students or advanced undergraduate students
# B) M( U4 [' f" V% h* V+ cwishing to develop background in this area.7 a1 h# E" N  Y
The idea for the book grew out of a course on thin ¯lms that has9 L1 L8 e9 e5 P* V( M7 ?$ ]
been o®ered for students in solid mechanics and materials science at Brown
6 k$ Z1 i# K/ y8 d5 Q" LUniversity since 1992, as a natural outgrowth of emerging research activity
1 r% q. B5 A8 U4 V7 K. U& H' Jin the area. We are grateful to the many students, postdoctoral research1 O/ u4 @& x) ]- d8 ^. N! A
associates and colleagues who attended these lectures and whose enthusiasm
  {4 u$ t# p: c* q5 j+ i0 D$ J5 v6 xgave this project its initial impetus.
% B- v$ ~. Q; H9 m4 d. JWe are also grateful to many colleagues who have contributed in various/ p+ J2 X5 y! [; t9 U  t
ways to the preparation of this book. We particularly thank John
* O6 T  c- e  S6 `8 S9 }Hutchinson who used a draft of parts of the book for a course for graduate* t- T8 F6 R9 U8 K
students at Harvard and MIT, and who provided valuable feedback on this) O4 K* d) R" J
material. Both John Hutchinson and Bill Nix kindly shared with us their) o; d8 V% X! j# \& k/ e- H' o
own course materials on thin ¯lms. Several colleagues read drafts of various
+ H: K- [, E/ J$ m8 \. x' Y# h2 g. Usections of the book and o®ered helpful recommendations; they include, \8 s5 j7 U8 L* ?
Ilan Blech, Eric Chason, Ares Rosakis, Vivek Shenoy and Carl Thompson.
5 r2 U5 g* R, c8 G/ G3 o) HSeveral graduate students who took courses based in part on draft chapters,0 J- J$ b- H2 a
particularly Yoonjoon Choi and Nuwong Chollacoop, suggested a number of6 T- K+ `3 s6 I( R! y
clari¯cations and improvements in the presentation. Finally, we are grateful
, b9 q" g$ Q5 \8 [. b) {; Pto the many colleagues who provided ¯gures and micrographs from their/ Q5 g, @; ?4 T5 Z/ b
own work; in these cases, acknowledgments are noted along with the included
4 a, j  L* t# dmaterial. Tim Fishlock at Cambridge University Press o®ered us
# O8 C: ?7 `/ G' ]& V4 Oconsiderable °exibility in the formulation of the scope of this book and in
" z7 K% y2 b3 v& Tthe preparation of the document.  J+ Z# e$ e3 R! t6 {* z6 V
LBF is grateful to the Materials Research Science and Engineering) n$ q1 ?4 l/ D1 \! l8 k
Center, funded by the National Science Foundation at Brown University,( u+ N$ C& Z/ Y# @/ I" O$ o
for long-term support of research in the general area of thin ¯lms and for& j0 v/ V3 l" Z) ~
the collaborations fostered through the Center. He is also thankful to the  ?1 p  O2 Y  c1 B
Division of Engineering and Applied Sciences at Caltech for hosting a sabxviii
8 r! D- l/ P$ k+ _3 [, o% U3 APreface' O1 p1 R$ k& h% U) M( b
batical leave; the kind hospitality and congenial environment a®orded an- b& y8 q& U  j. C- G# a3 y
opportunity for pursuing the book writing project at its early critical stage.7 o- p2 n+ g4 v! d' D+ J- O0 N
SS is grateful to the Defense University Research Initiative in NanoTechnology,+ {) r( _( y: J( p4 U% F
funded by the O±ce of Naval Research at MIT, and the Programme on
. h/ }9 c  g7 ]) }& F1 pAdvanced Materials for Micro and Nano Systems, funded by the Singapore-
% q$ r& [3 N3 r$ b1 z' ~% HMIT Alliance, for their ¯nancial support for research in the areas covered
( L8 D  M: W1 D* w. ?by the book.
0 `# U5 a) j9 |% v! g8 j1 P3 {A project of this magnitude would not have been possible without8 ^! _7 |! X/ E# p
the support and encouragement of the members of our families. We are
& r* \2 f# S4 Lextremely grateful for their enduring patience and understanding during
: B2 E3 ?8 c/ O2 j4 A- B- ]our long hours of immersion in this project over the past several years.0 M% r' y& \3 y2 S
L. B. Freund and S. Suresh5 N- h- W3 ~/ D; y3 @
January 2003

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发表于 2006-4-11 14:27:45 | 显示全部楼层
顶啊
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发表于 2006-4-11 20:06:58 | 显示全部楼层
好象这里挺热闹的。
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发表于 2006-4-11 20:08:52 | 显示全部楼层
确实不错,支持
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发表于 2006-4-11 20:09:19 | 显示全部楼层
应该还有后文吧
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发表于 2006-4-11 20:09:51 | 显示全部楼层
期待楼主的新帖
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发表于 2006-4-13 15:41:59 | 显示全部楼层
我顶
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发表于 2006-4-15 02:43:33 | 显示全部楼层
谢谢楼主,收藏了
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发表于 2006-4-23 15:22:00 | 显示全部楼层
楼主何不做个好事,把书发出来,让我们来下载呀
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