关于提高附着力的办法（英文）

There are a number of ways to modify the nucleation density of
0 o& g4 b& D3 t1 [depositing atoms on substrate surfaces including:
• Change the deposition temperature
8 ^( o/ I) L+ K* o, f$ F) D4 [. _increasing—increases reaction with the surface; increases surface mobility
& W/ R6 v( U! y- ]& E8 Wdecreasing—decreases surface mobility
6 m9 N6 m1 G3 V# M' ]• Increase the deposition rate to increase collision probability of the adatoms
• Change the surface chemistry to make the surface more
reactive—e.g., cleaning,oxygen treatment of polymer
- t9 U4 _& Y7 j" F, Osurfaces
• Sensitizing the surface by the addition of “nucleating agents”
• Generation of nucleation sites on the surface—e.g., lattice
defects, charge sites on insulators by
© energetic particle bombardment to produce lattice
defects
© incorporation of species into the surface by ion
$ @6 M' s% d# i/ i( rimplantation or chemical substitution
5 C& R( D. L2 s5 k. q7 A© electron bombardment —charge centers on
insulator surfaces
© photon bombardment ]—charge centers on insulator
Surfaces
) t# \, Y' ?* b( I• Co-deposition or absorption of reactive species
+ g/ i' q# R- t/ F3 o* s/ Z# e• Surface morphology—roughening or smoothing
/ @/ E% v# Y0 J9 x( J( b  Z7 x/ D• Creation of a new surface—“basecoat” or “glue layer”

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