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Thin-film multilayer design optimization using a Monte Carlo$ I# ]" ?" ?9 _' J7 C
approach' Y% J1 d% n/ @) f
W. J. Wild and H. Buhay; o c1 h8 K% z
Microwave & Electro-Optics Department, IIT Research Institute, 10 West 35th Street, Chicago, Illinois 60616
2 j9 V6 B- E# B" G0 W5 LReceived April 23, 1986; accepted August 8, 1986
2 g2 I; H: G" |! T( VAn iterative Monte Carlo thickness-varying strategy is presented and used to optimize normal-incidence thin-film
: Y5 t& e2 U7 Y( g: smultilayer designs and demonstrated for a variety of circumstances. The technique does not get trapped in local
. [, H( h: L1 }* I) D7 n& y/ `6 wminima and, in principle, can home in on the best global design. |
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