Materials selection for thin films for radio frequency

zyp

Materials selection for thin films for radio frequency
microelectromechanical systems
$ J  y+ C# ]" x# T5 bG. Guisbiers *, O. Van Overschelde, M. Wautelet
6 W( ~" @0 E, Q! ]6 uPhysics of Condensed Matter, University of Mons-Hainaut, 23 Avenue Maistriau, 7000 Mons, Belgium
7 `7 g% N% S% c; j/ U6 D! a0 f. [Received 16 August 2005; accepted 6 April 2006
$ y1 g) K, ^% [. aAbstract
Materials selection is an important subject in microtechnology. The methodology developed by Ashby is used here. It is shown that it
can be applied easily to microelectromechanical systems (MEMS). Firstly, a selection concerning a minimization of intrinsic residual
stresses for thin films deposited by evaporation process is presented. Secondly, the selection of materials to serve in the design of the
( D& `+ i2 V$ c7 Rbridge of a MEMS-RF switch and a MEMS-RF varicap (variable capacitor) is considered.
9 @5 W  `8 ]! u, g1 g; J6 o3 f1 J3 C  F 2006 Elsevier Ltd. All rights reserved.

duanjun2000

是楼主自己写的吗？