X-ray Reflectivity Evaluation for the Density of
X-ray Reflectivity Evaluation for the Density of Au Thin Film Deposited on SiliconZHANG Yan-ping CHANG Hong-wei DU Shu-bin Kenji Sakurai不详 National Institute for Materials Science, Tsukuba, Ibaraki 305-0044, Japan摘 要:关键词:极低密度 Au薄膜 X射线 评价 反射 沉积 硅 金薄膜
分类号: O434.1 TQ325.12[机标]
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栏目信息：FUNDAMENTAL AND APPLIED FUNDAMENTAL RESEARCH
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X-ray Reflectivity Evaluation for the Density of Au Thin Film Deposited on SiliconAbstract:In present work, we will reports puttered gold thin film that sometimes has extremely low density （6.1 g/cm^3, 32% to the bulk value 19.3 g/cm^3 found in the literature） based on XRR studies, low-density sample is thick and the thickness is about 3.29 times to that of high-density sample, XRR measurements see Fig. 1.[第一段]
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