zyp进来领取奖品：THIN FILM PROCESSES II
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Thin FilmProcesses I1 was developed to provide a completely new
Thin Film Processes, which was published in 1978. The first book
sequel to
11 classes of thin film deposition and etching processes
included reviews of
from a practical point of view. Also included in an introductory chapter
were referencesto numerous other processes which, at the time, either
were not mature enough to be reviewed or had been reviewed adequately
elsewhere. Since then, several new processes have matured, and others
Thin Film Processes or elsewhere have advanced
that had been reviewed in
to the pointwhereanotherreviewseems desirable. These have been
selectedforreviewinthisbook.As before,the introductory chapter
provides referencesto processes notreviewed in this book, as wellas
references to complementary reviews of some of the topics covered here.
As inthe first volume,the reviewsoffilmdepositionand etching
Thin Film Processes 11 are intended to be tutorial. Emphasis is
processes in
placed
on the practical use of the processes to provide working guidelines
for their implementation, an overview ofeach class
ofprocesses, and a
guide to the literature. It is hoped that the book will be useful both to those
on a process or processes and to
who wish to gain a broad perspective
specialists using these processes.
These reviews were completed in mid-1990 and literature published up
to that time is included. It is recognized that many of these processes are
being investigated actively. We hope that this research and development
will shed light on some ofthe questions that remain unanswered at this
time, leading to a more rational selection and use of thin film processes.
Finally, we wish to thank the contributing authors for their consider-
able efforts in summarizing the voluminous literature of their specialties.
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