|
X-ray Reflectivity Evaluation for the Density of Au Thin Film Deposited on SiliconZHANG Yan-ping[1] CHANG Hong-wei[1] DU Shu-bin[1] Kenji Sakurai[2][1]不详 [2]National Institute for Materials Science, Tsukuba, Ibaraki 305-0044, Japan摘 要:: c& p9 a. I$ M$ m( _* h
/ Y1 b& `, r0 q关键词:极低密度 Au薄膜 X射线 评价 反射 沉积 硅 金薄膜0 o N7 M; {$ Z3 Q' H
1 I0 i0 U- S# k3 g3 O1 F" w4 z8 F/ G分类号: O434.1 TQ325.12[机标]
( t, Q$ G" S" v$ m, s文献标识码:2 d% E$ E W" o# ], b+ M
文章编号:6 P3 m/ G3 V& g# O- i! L& K& O3 T
栏目信息:FUNDAMENTAL AND APPLIED FUNDAMENTAL RESEARCH
9 u2 e8 ^: z: l; n! j
/ }0 d7 y! V" Q, x0 e5 D相关文献:主题相关 全文快照 3 q0 v' b O8 w: w9 ]+ j
: B* R8 \: V- C! t& W/ F; ?: g j8 N C1 |, C" ]2 O: ~8 @+ P# V
X-ray Reflectivity Evaluation for the Density of Au Thin Film Deposited on SiliconAbstract:In present work, we will reports puttered gold thin film that sometimes has extremely low density (6.1 g/cm^3, 32% to the bulk value 19.3 g/cm^3 found in the literature) based on XRR studies, low-density sample is thick and the thickness is about 3.29 times to that of high-density sample, XRR measurements see Fig. 1.[第一段]' F6 {+ c- v# P$ O* f; @$ Q% i
# S3 v1 [ {; w0 {$ r6 G, pKey words:( p! E' g/ m' N
$ \; n3 _( n* q8 V" h3 k0 W1 ^
$ ~( n) j o& ?- R5 S- Y! @& A0 p6 B9 M0 P3 h3 X/ B l/ z1 m
" D, s" C5 {9 f1 t+ `& C
/ E/ z x4 y1 w8 }9 L
# O( y3 z! q- o" E0 e9 }$ o$ } |
本帖子中包含更多资源
您需要 登录 才可以下载或查看,没有帐号?注册
x
|