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Optical thin film is required to have extreme low optical loss for precision optical application, and high productivity and low running cost for industrial mass production. For the needs, a new IAD (Ion assist deposition) technology that is said EPD (Efficiency PVD) is developed by Shincron. The EPD coater has higher deposition rate compare with conventional IAD coating technology through improving ion assist efficiency. The deposition rate of EPD SiO2 thin film is above 3nm/s. And the EPD thin film shows dense microstructures and high refractive index is about 1.482. The 36layer IRcut filter stacked by TiO2 and SiO2 shows extreme low optical scatter, R+T is larger than 99.8%.
/ ?# m& g9 i8 u& H+ Thttp://pan.baidu.com/share/link?shareid=132693&uk=2013391093 |
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发表于 2012-12-1 05:27:04
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发表于 2012-12-1 05:38:46
