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热蒸发YbF3薄膜的机械特性0 f2 e3 B. B5 U
摘 要:实验研究了热蒸发YbF3薄膜在大气中的应力和附着力。利用Veeco干涉仪，测试了各种工艺条件下单层YbF3薄膜的应力。结果发现：YbF3薄膜的残余应力为张应力，热应力在残余应力中的比重较大；沉积方式对薄膜应力的影响不大；薄膜应力在大气中有一个释放的过程。热处理后。YbF3薄膜应力增大。[著者文摘]
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关键词:光学薄膜 YbF3薄膜 应力分析 附着力 热蒸发/ h# U4 j( x3 k$ f' r
分类号: O484.4[著者标引]文献标识码：A文章编号：1001-4322（2008）08-1306-03栏目信息：ICF与激光等离子体
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S V# x3 o; O( H: [; b1 K; lMechanical properties of YbF3 thin film deposited by thermal evaporationZHANG Yin-hua, HUANG Wei, ZHANG Yun-dong Institute of Optics and Electronics, Chinese Academy of Sciences , P. O. Box 350, Chengdu 610209, ChinaAbstract:The stress and adhesion of YbFa thin film deposited by thermal evaporation have been investigated. The stresses of singlelayer YbFa thin films at different technical conditions have been evaluated by using a Veeeo interferometer. In our experiment. residual stress of YbFa thin film is tensile. Thermal stress seems to be the main contribution to the residual stress. Deposition method affects the stress of thin film. The stress relaxation is observed in air. The stress of YbF3 thin film increases after heat treatment.[著者文摘]8 n# ^$ f) W7 @: u" ]
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Key words:Optical film; YbF3 film; Stress analysis; Adhesion;Thermal evaporation |
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发表于 2008-12-22 04:29:34
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