闭磁场非平衡磁控溅射在光学薄膜中的应用

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闭磁场非平衡磁控溅射在光学薄膜中的应用
6 ]$ L( C+ E& C【英文篇名】 Application of Closed Field-unbalanced Magnetron Sputtering in Optical Coatings
! c: E- z4 G# I9 k; D【作者中文名】 陈楠; 贾克辉; 卜轶坤;
【作者英文名】 CHEN Nan1; JIA Ke-hui2; Bu Yi-kun3 （1.Changchun Taxation College; Changchun 130012; China; 2.Meng Xi Trade Co.; Ltd.; Shanghai 201000; 3.Changchun Institute of Optics; Fine Mechanics and Physics; Chinese Academy of Sciences; Changchun 130033; China）;
# D" c. B- f4 s【作者单位】 长春税务学院; 梦溪贸易有限公司; 中国科学院长春光学精密机械与物理研究所 吉林长春; 吉林长春;
. J1 N% J3 p/ D* ^- q【文献出处】 光机电信息, OME Information, 编辑部邮箱 2007年 09期  
/ _1 f6 {/ W# c; u5 u  g期刊荣誉：ASPT来源刊  CJFD收录刊
( ?$ O: h: f; I+ A8 t【关键词】 闭磁场; 光学薄膜; 磁控溅射;
【英文关键词】 closed field magntron; optical coatings; magnetron sputtering;
# c- k2 z2 a5 A9 I* m【摘要】 介绍了一种制备高质量光学薄膜的新型闭磁场磁控溅射技术。该技术具有高束流密度和低内应力,可以在高沉积速率条件下制备性能极佳的精密光学薄膜。采用精密的单轴圆鼓基板系统,可显著提高批量镀膜的能力。
【英文摘要】 A new type closed field-unbalanced magnetron sputtering technology for optical coatings is described. With advantages of high ion current density and low internal stress, this new technology can prepare films with excellent and reproducible optical properties over a large surface area at high deposition rate. High throughput deposition can be achieved by single-axis round drum carrier.
8 K4 V( ^9 O: o# M- h3 B【DOI】 CNKI:SUN:GJDX.0.2007-09-004