沉积工艺条件对金刚石薄膜红外椭偏光学性质的影响

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沉积工艺条件对金刚石薄膜红外椭偏光学性质的影响
   
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【英文篇名】 Effects of deposition conditions on infrared spectroscopic ellipsometry of CVD diamond films
【摘要】 采用红外椭圆偏振光谱仪对不同工艺条件下制备的CVD金刚石薄膜在红外波长范围内的光学参量进行了测量,分析了工艺条件对金刚石薄膜红外光学性质的影响.获得了最佳的沉积工艺参数,优化了薄膜的制备工艺.结果表明薄膜的折射率和消光系数与薄膜质量密切相关,当温度为750℃,碳源浓度为0·9%和压强为4·0kPa时,金刚石薄膜的红外椭偏光学性质最佳,折射率平均值为2·385,消光系数在10-4范围内,在红外波段具有良好的透过性.
& |: v. m5 y# j7 P. [5 q【英文摘要】 Diamond films deposited by hot filament chemical vapor deposition (HFCVD) under different deposition conditions are characterized using spectroscopic ellipsometric measurements in infrared region of 2.5—12.5 μm. Effects of deposition conditions on infrared spectroscopic ellipsometry of diamond films are investigated. The optical properties of diamond films depend strongls on its quality. The refractive index increases and the extinction coefficient decreases monotonicly with increasing sp~3 C content. High ...
【基金】 国家自然科学基金(批准号:60577040);; 上海市纳米专项(批准号:0452nm051);; 上海应用材料研究与发展基金(批准号:0404);; 上海市重点学科(批准号:T0101)资助的课题.~~
【DOI】 cnki:ISSN:1000-3290.0.2006-10-026