特定折射率材料及光学薄膜制备
特定折射率材料及光学薄膜制备申振峰中国科学院长春光学精密机械与物理研究所中国科学院光学系统先进制造技术重点实验室,吉林长春130033摘 要:根据太阳电池阵激光防护膜性能优化的需要，应用离子辅助电子束双源共蒸工艺方法制备了优化设计所需的特定折射率的薄膜材料并用于制备激光防护膜。测试结果显示：用该工艺方法制备的掺杂材料薄膜的折射率n＝1.75，与优化设计所需数值相符；激光防护膜性能优良，太阳辐射能透过率提高6％以上，实现了对该激光防护膜性能的进一步优化。为了使该双源共蒸方法适于大面积薄膜的制备，应用均匀性挡板技术来提高该方法制备大面积薄膜的膜厚均匀性，使制备的掺杂材料薄膜在口径为400 mm时的不均匀性小于2.1％。该双源共蒸方法制备工艺简单、可靠，适于实际工程应用。薄膜性能测试结果与理论优化结果相符，达到预期优化目标。[著者文摘]关键词:薄膜材料 激光防护膜 折射率 掺杂 双源共蒸
分类号: O484.1[著者标引]
文献标识码：A
文章编号：2095-1531（2013）06-0900-06
栏目信息：光学功能材料
相关文献:主题相关
Preparation of specific refractive index material and optical thin filmsSHEN Zhen-feng Key Laboratory of Optical System Advanced Manufacturing Technology, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun 130033, China Abstract:A material with specific refractive index is prepared according to the requirement for the preparation of the laser protective coating for solar arrays .In this method , we apply the electron beam co-evaporation tech-nique based on doped material preparation methods .Tests show that the refractive index of the doped material is 1.75 , according with the result of optimized scheme .The material is then used in the preparation of optical thin films to achieve a further optimization of the laser protective coating properties .Obtained laser protective coating has excellent properties and its solar radiation transmittance is increased by more than 6%.The film thickness mask technology is applied to improve the film thickness uniformity of large area thin films prepared＆nbsp;by co-evaporation method .The thickness nonuniformity of doped material film prepared by this method withinΦ400 mm area is less than 2.1%.It is showed that the technical process of electron beam co-evaporation technique is simple , reliable and suitable for practical applications .Test results of the film performance are consistent with the theoretical optimized results .[著者文摘]
Key words:thin film material;laser protective coating;refractive index;doping;co-evaporation
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