锗基底7～11．5μm高性能红外宽带减反射膜的研究
锗基底7～11．5μm高性能红外宽带减反射膜的研究潘永强 朱昌 杭凌侠西安工业学院光电工程学院,陕西西安710032摘 要:为了提高锗基底的透过率和膜层的机械强度，对锗基底上高性能的红外宽带减反射膜的设计与制备工艺进行了研究。介绍了红外宽带减反射膜的膜料选择、膜系设计以及采用离子束辅助沉积该膜系的过程。给出了用该方法制备的7～11．5μm波段宽带减反射膜的实测光谱曲线，其峰值透过率高达99．5％以上，在设计波段范围内平均透过率大于97．5％，膜层附着性能好，光机性能稳定。这对于红外光学系统的应用具有十分重要的意义。[著者文摘]
关键词:红外减反射膜 离子束辅助沉积 锗基底
分类号: TN213-34[著者标引]文献标识码：A文章编号：1002-2082（2005）06-0063-03栏目信息：薄膜技术
相关文献:主题相关
Study on high performance infrared wide-band （ 7-11.5μm） antireflective film on germanium substratePAN Yong-qiang, ZHU Chang, HANG Ling-xia Xi＇an Institute of Technology, Xi＇an 710032, ChinaAbstract:In order to enhance the transmission of germanium and mechanical feature of the antireflective film, the design and preparation of the high performance infrared wide-band antireflective film deposited on germanium substrate by ionbeam assisted deposition are investigated. The selection of film material, the design of film systems and the process of the ion-beam assisted deposition for the film systems are introduced. The measured spectral curves of the antireflection film at 7-11.5μm, deposited by this method, are given. The experimental results show that the peak transmission of the film is more than 99.5%, the average transmission in the designed wavelength range is greater than 97.5%, the film adherency is good, the optical and mechanical properties are stable. These are critical for the application of infrared optical systems.[著者文摘]
Key words:infrared antireflective film; ion-beam assisted deposition（IBAD） ; germanium substrate 我想看看 谢谢，下了。
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